Serum with low molecular weight and high molecular weight hyaluronic acid “Deep Moisturizing Serum II”

The serum contains 3 types of hyaluronic acid and low molecular weight oligosaccharides obtained by fermentation. The combination of molecules of different masses fills in irregularities and wrinkles, stimulates the synthesis of collagen, own hyaluronic acid and glycosaminoglycans of the intercellular matrix, restores normal skin metabolism. D-panthenol soothes the skin, relieves inflammation, redness and irritation of the skin.

Active ingredients: high molecular weight hyaluronic acid, low molecular weight hyaluronic acid with a mass of MW 10-20 KDa, extremely low molecular weight hyaluronic acid and oligosaccharides (<10kDa) obtained by fermentation.

The scope of application of hardware cosmetology: microcurrent therapy, iontophoresis, phonophoresis, ultrasound therapy, electroporation, RF-lifting, laser phoresis, photo- and chromotherapy, bioporation, needleless mesotherapy.

The serum is indicated for hardware administration, as well as for home care, applied 1-2 times a day under the cream.